Nickel Sputtering Target Thin Films
Xubo produces high purity nickel sputtering targets, whose most important benefit is the ability to obtain films with excellent electrical conductivity and particle minimization during physical vapor deposition
Product Introduction
Nickel Sputtering Target Thin Films are used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coatings, and have good application prospects as well as other optical information storage space industries, glass coating industries such as automotive glass and architectural glass, and optical communication industries.
Other applications of nickel include use in the manufacture of stainless steel, coins and batteries. When evaporated in a vacuum, nickel can be used to form decorative coatings on ceramic surfaces or to form solder layers in circuit device manufacturing. It is often sputtered to form layers in the production of magnetic storage media, fuel cells and sensors.
Nickel (Nickel), is a hard, ductile and ferromagnetic metal that is highly polished and resistant to corrosion. Nickel is an iron-loving element. The Earth's core is mainly composed of iron and nickel elements. In the earth's crust, ferromagnesian rocks contain more nickel than silica-aluminous rocks, for example, peridotite contains 1000 times more nickel than granite, and gabbro contains 80 times more nickel than granite.It has good ductility and is moderately hard.
Nickel is a silvery-white metal with magnetic properties and good malleability. With good corrosion resistance, nickel is nearly silvery-white, hard and ductile and ferromagnetic metal element, which is highly polished and resistant to corrosion.
Purity of nickel target: 99.9%, 99.99%, 99.95%
Density: 8.902g/cm3
Melting point: 1453℃
Boiling point: 2732℃
Vapor pressure is 237Pa(1726K)
Nickel Ni Sputtering Targets shape: flat target rotary target shaped custom
The production method of Nickel Sputtering Target
The nickel plate is polished, and the polished nickel plate is centrifugally ground to make the nickel target. Since nickel metal has good mechanical strength and strong ability to resist deformation and fracture when subjected to external force, it is suitable for polishing and grinding processing. The oxides and their impurities on the surface of nickel plate can be effectively removed by polishing, followed by further removal of impurities on the surface of nickel plate by centrifugal grinding, and the cleanliness of nickel target material is effectively improved by polishing combined with centrifugal grinding.
Types of nickel target alloys
AlNi alloy, CuNi alloy, NiCr alloy, NiFe alloy, NiMg alloy, NiMn alloy, NiTi alloy, NiVanadium alloy, NiZr alloy, etc.
Nickel target analysis methods: 1, using GDMS for metal impurity elements; 2, using LECO for gas element analysis.
The following table is a certificate of analysis of the composition of nickel sputtering target thin films:
Shipping & Packing：
Customer Feedback.
why choose us:
(1) XUBO being a quality-centered organization in this industry, we are committed to offer a wide range of Nickel Sputtering Target Thin Films.
(2) Flawless finish, sturdy structure, and corrosion resistance
(3) xubo offers these products at reasonable prices and delivers these products within the promised time frame
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