Tantalum Metal Sputtering Target
We produce high purity sputtering targets, whose most important benefit is to obtain films with excellent electrical conductivity and particle minimization during physical vapor deposition.
Product Introduction
High performance Tantalum Metal Sputtering Target can be used in thin film coating, CD-ROM, decoration, flat panel display, functional coating, and other optical information storage space industries, glass coating industries such as automotive glass and architectural glass, optical communication, etc.
Name: Tantalum target Sputtering tantalum target Tantalum round target Tantalum round ingot
Grade: Ta1.Ta2.TaW2.5.TaW10
Purity: pure tantalum Ta1≥99.95%
Resistivity 13.5µOhmcm
Temperature coefficient 0.00350K-¹
Bulk modulus 196.3 GPa
Tensile modulus 185.70 GPa
Density 16.600 g/cm³
Boiling point 5425°C
Melting point 2996.00°C
Coefficient of thermal expansion 6.500x10-⁶ K-¹
Thermal conductivity 57.50W m-¹ K-¹
how does Sputtering Target work?
our service:
Custom size
Custom shape
Product testing
shipping&packing:
customer feedback:
what are tantalum sputtering targets used for ?
Thin film coating, CD-ROM, decoration, flat panel display, functional coating, and other optical information storage space industries, glass coating industries such as automotive glass and architectural glass, optical communications, etc.
why choose us:
(1) We formulate and produce targets of rare or infrequent composition as well as a wide range of standard Tantalum Metal Sputtering Target at competitive prices.
(2) Large long-term orders lead to customization of specified materials
(3)Guaranteed purity
(4) Good target surface roughness
(5) High stability of film resistance after deposition
(6) Low particle size
(7) Standard custom shapes, sizes and diameters available
(8) Our team works hard to develop new product sizes and geometries
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