WebA high purity titanium polycrystalline target with uniform grain size and near ideal (103) crystallographic orientation and a method of making. Uniform grain size from 10 μm-500 μm is achieved by...
A high-purity titanium sputtering target having controlled crystal characteristics. The problems in connection with particle generation and lowered film forming rate in collimation sputtering are...
Titanium Sputtering Target Titanium is a common material found in many products, including watches, drill bits, laptops, and bicycles, just to name a few. In pure form, it is lustrous and...
WebThe uniform problem of film thickness distribution on a substrate can be solved by adopting the requirements that (a) the average crystal grain diameters at various portions of the...
Sputtering Targets Our high-purity, low-spit targets can resolve your concerns for uniformity, reproducibility and homogeneity. We manufacture sputtering...
Titanium Target for Gettering Material As a chemically active metal, titanium can react with many elements and compounds at high temperature. High-purity titanium is highly adsorbent to active gases...









